CCD-world: thermal annealing

[Jean Marc DEFISE]

The following was posted to CCD-world:


What is the minimum temperature to reach an efficient thermal annealing of
Si-SiO2 interface traps ?
Some authors reported more than 150°C, but practically this is not a
device-compatible temperature.


JM Defise

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Jean Marc DEFISE
CENTRE SPATIAL DE LIEGE
Avenue du Pre Aily B-4031 Angleur BELGIUM
www.ulg.ac.be/cslulg
jmdefise at ulg.ac.be
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